- Equipment Partners
- scia Systems
- Ion Beam Technology
- scia Mill 200
scia Mill 200
The scia Mill 200 is designed for structuring complex multilayers of various materials. It offers precise process control with customisable endpoint detection systems. Featuring full reactive gas compatibility, the system enables reactive etching with enhanced selectivity and rate. Its flexible design allows adaptation for both single-substrate applications and high-volume production cluster configurations, with up to three process chambers and two cassette load locks.
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